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Precursor Supply System
Precursor Supply System is a device to safely supply precursor required for semiconductor CVD process for thin film deposition with constant flow rate and pressure. This unit is designed to supply the precursor without process interruption by installing bulk / process canister.


Precursor Supply System

Product Features
  • Applicable Precursor: TEOS, TICL4, TEB, TEPO, LTO-520, TMB, HCDS, C6H12, 4MS, TBAS, DEZ, LTO-770 & TDMAS
  • PLC and touch screen based automation system